In-situ observation of stacking fault evolution in vacuum-deposited C60

We report an in-situ study of stacking fault evolution in C 60 thin films using grazing-incidence x-ray scattering (GIXS). A Williamson-Hall analysis of the main scattering features during growth of a 15 nm film on glass indicate lattice strain as high as 6% in the first 5 nm of the film, with a dec...

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Main Authors: Martinez Hardigree, J, Ramirez, I, Mazzotta, G, Nicklin, C, Riede, M
Format: Journal article
Published: AIP Publishing 2017
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author Martinez Hardigree, J
Ramirez, I
Mazzotta, G
Nicklin, C
Riede, M
author_facet Martinez Hardigree, J
Ramirez, I
Mazzotta, G
Nicklin, C
Riede, M
author_sort Martinez Hardigree, J
collection OXFORD
description We report an in-situ study of stacking fault evolution in C 60 thin films using grazing-incidence x-ray scattering (GIXS). A Williamson-Hall analysis of the main scattering features during growth of a 15 nm film on glass indicate lattice strain as high as 6% in the first 5 nm of the film, with a decrease to 2% beyond 8 nm thickness. Deformation stacking faults along the {220} plane are found to occur with 68% probability, and closely linked to the formation of a nanocrystalline powder-like film. Our findings, which capture monolayer-resolution growth, are consistent with previous work on crystalline and powder C60 films and provide a crystallographic context for the realtime study of organic semiconductor thin films.
first_indexed 2024-03-06T23:38:07Z
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spelling oxford-uuid:6e5d65db-3f5c-4dd2-998d-30985a3e7d722022-03-26T19:24:02ZIn-situ observation of stacking fault evolution in vacuum-deposited C60Journal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:6e5d65db-3f5c-4dd2-998d-30985a3e7d72Symplectic Elements at OxfordAIP Publishing2017Martinez Hardigree, JRamirez, IMazzotta, GNicklin, CRiede, MWe report an in-situ study of stacking fault evolution in C 60 thin films using grazing-incidence x-ray scattering (GIXS). A Williamson-Hall analysis of the main scattering features during growth of a 15 nm film on glass indicate lattice strain as high as 6% in the first 5 nm of the film, with a decrease to 2% beyond 8 nm thickness. Deformation stacking faults along the {220} plane are found to occur with 68% probability, and closely linked to the formation of a nanocrystalline powder-like film. Our findings, which capture monolayer-resolution growth, are consistent with previous work on crystalline and powder C60 films and provide a crystallographic context for the realtime study of organic semiconductor thin films.
spellingShingle Martinez Hardigree, J
Ramirez, I
Mazzotta, G
Nicklin, C
Riede, M
In-situ observation of stacking fault evolution in vacuum-deposited C60
title In-situ observation of stacking fault evolution in vacuum-deposited C60
title_full In-situ observation of stacking fault evolution in vacuum-deposited C60
title_fullStr In-situ observation of stacking fault evolution in vacuum-deposited C60
title_full_unstemmed In-situ observation of stacking fault evolution in vacuum-deposited C60
title_short In-situ observation of stacking fault evolution in vacuum-deposited C60
title_sort in situ observation of stacking fault evolution in vacuum deposited c60
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AT ramirezi insituobservationofstackingfaultevolutioninvacuumdepositedc60
AT mazzottag insituobservationofstackingfaultevolutioninvacuumdepositedc60
AT nicklinc insituobservationofstackingfaultevolutioninvacuumdepositedc60
AT riedem insituobservationofstackingfaultevolutioninvacuumdepositedc60