Submicron patterning of DNA oligonucleotides on silicon.
The covalent attachment of DNA oligonucleotides onto crystalline silicon (100) surfaces, in patterns with submicron features, in a straightforward, two-step process is presented. UV light exposure of a hydrogen-terminated silicon (100) surface coated with alkenes functionalized with N-hydroxysuccini...
Main Authors: | Yin, H, Brown, T, Wilkinson, J, Eason, R, Melvin, T |
---|---|
Format: | Journal article |
Language: | English |
Published: |
2004
|
Similar Items
-
Photo-patterning of DNA oligonucleotides on silicon surfaces with micron-scale dimensions
by: Yin, H, et al.
Published: (2004) -
Chemical modification and micropatterning of Si(100) with oligonucleotides
by: Yin, H, et al.
Published: (2004) -
Deep submicron silicon on insulator (SOI) MOSFET /
by: Vijay, K. Arora, et al.
Published: (2008) -
Genomic sequence correction by single-stranded DNA oligonucleotides: role of DNA synthesis and chemical modifications of the oligonucleotide ends.
by: Olsen, P, et al.
Published: (2005) -
Modeling of deep submicron silicon on insulator (SOI) mosfet /
by: 250864 Aiman Abdul Rashid, et al.