Controlling coverage of solution cast materials with unfavourable surface interactions
Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconduct...
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Format: | Journal article |
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2014
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author | Burlakov, V Eperon, G Snaith, H Chapman, S Goriely, A |
author_facet | Burlakov, V Eperon, G Snaith, H Chapman, S Goriely, A |
author_sort | Burlakov, V |
collection | OXFORD |
description | Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage. © 2014 AIP Publishing LLC. |
first_indexed | 2024-03-07T00:20:34Z |
format | Journal article |
id | oxford-uuid:7c675cdb-9caa-4826-a708-5f5723044aaa |
institution | University of Oxford |
last_indexed | 2024-03-07T00:20:34Z |
publishDate | 2014 |
record_format | dspace |
spelling | oxford-uuid:7c675cdb-9caa-4826-a708-5f5723044aaa2022-03-26T20:56:52ZControlling coverage of solution cast materials with unfavourable surface interactionsJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:7c675cdb-9caa-4826-a708-5f5723044aaaSymplectic Elements at Oxford2014Burlakov, VEperon, GSnaith, HChapman, SGoriely, ACreating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage. © 2014 AIP Publishing LLC. |
spellingShingle | Burlakov, V Eperon, G Snaith, H Chapman, S Goriely, A Controlling coverage of solution cast materials with unfavourable surface interactions |
title | Controlling coverage of solution cast materials with unfavourable surface interactions |
title_full | Controlling coverage of solution cast materials with unfavourable surface interactions |
title_fullStr | Controlling coverage of solution cast materials with unfavourable surface interactions |
title_full_unstemmed | Controlling coverage of solution cast materials with unfavourable surface interactions |
title_short | Controlling coverage of solution cast materials with unfavourable surface interactions |
title_sort | controlling coverage of solution cast materials with unfavourable surface interactions |
work_keys_str_mv | AT burlakovv controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions AT eperong controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions AT snaithh controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions AT chapmans controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions AT gorielya controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions |