Controlling coverage of solution cast materials with unfavourable surface interactions

Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconduct...

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Main Authors: Burlakov, V, Eperon, G, Snaith, H, Chapman, S, Goriely, A
Format: Journal article
Published: 2014
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author Burlakov, V
Eperon, G
Snaith, H
Chapman, S
Goriely, A
author_facet Burlakov, V
Eperon, G
Snaith, H
Chapman, S
Goriely, A
author_sort Burlakov, V
collection OXFORD
description Creating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage. © 2014 AIP Publishing LLC.
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spelling oxford-uuid:7c675cdb-9caa-4826-a708-5f5723044aaa2022-03-26T20:56:52ZControlling coverage of solution cast materials with unfavourable surface interactionsJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:7c675cdb-9caa-4826-a708-5f5723044aaaSymplectic Elements at Oxford2014Burlakov, VEperon, GSnaith, HChapman, SGoriely, ACreating uniform coatings of a solution-cast material is of central importance to a broad range of applications. Here, a robust and generic theoretical framework for calculating surface coverage by a solid film of material de-wetting a substrate is presented. Using experimental data from semiconductor thin films as an example, we calculate surface coverage for a wide range of annealing temperatures and film thicknesses. The model generally predicts that for each value of the annealing temperature there is a range of film thicknesses leading to poor surface coverage. The model accurately reproduces solution-cast thin film coverage for organometal halide perovskites, key modern photovoltaic materials, and identifies processing windows for both high and low levels of surface coverage. © 2014 AIP Publishing LLC.
spellingShingle Burlakov, V
Eperon, G
Snaith, H
Chapman, S
Goriely, A
Controlling coverage of solution cast materials with unfavourable surface interactions
title Controlling coverage of solution cast materials with unfavourable surface interactions
title_full Controlling coverage of solution cast materials with unfavourable surface interactions
title_fullStr Controlling coverage of solution cast materials with unfavourable surface interactions
title_full_unstemmed Controlling coverage of solution cast materials with unfavourable surface interactions
title_short Controlling coverage of solution cast materials with unfavourable surface interactions
title_sort controlling coverage of solution cast materials with unfavourable surface interactions
work_keys_str_mv AT burlakovv controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions
AT eperong controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions
AT snaithh controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions
AT chapmans controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions
AT gorielya controllingcoverageofsolutioncastmaterialswithunfavourablesurfaceinteractions