Nitrogen-doped silicon: Mechanical, transport and electrical properties
A novel dislocation locking technique is used to study the behaviour of nitrogen in float-zone silicon (FZ-Si). Specimens containing well-defined arrays of dislocation half-loops are subjected to isothermal anneals of controlled duration, during which nitrogen diffuses to the dislocations. The stres...
Main Authors: | Murphy, J, Alpass, C, Giannattasio, A, Senkader, S, Emiroglu, D, Evans-Freeman, J, Falster, R, Wilshaw, P |
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Format: | Journal article |
Sprog: | English |
Udgivet: |
2006
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Lignende værker
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Nitrogen in silicon: Transport and mechanical properties
af: Murphy, J, et al.
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Nitrogen in silicon: Transport and mechanical properties
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The influence of nitrogen on dislocation locking in float-zone silicon
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The influence of nitrogen on dislocation locking in float-zone silicon
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Out-diffusion of nitrogen from float-zone silicon measured by dislocation locking
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Udgivet: (2007)