Nitrogen-doped silicon: Mechanical, transport and electrical properties
A novel dislocation locking technique is used to study the behaviour of nitrogen in float-zone silicon (FZ-Si). Specimens containing well-defined arrays of dislocation half-loops are subjected to isothermal anneals of controlled duration, during which nitrogen diffuses to the dislocations. The stres...
主要な著者: | Murphy, J, Alpass, C, Giannattasio, A, Senkader, S, Emiroglu, D, Evans-Freeman, J, Falster, R, Wilshaw, P |
---|---|
フォーマット: | Journal article |
言語: | English |
出版事項: |
2006
|
類似資料
-
Nitrogen in silicon: Transport and mechanical properties
著者:: Murphy, J, 等
出版事項: (2006) -
Nitrogen in silicon: Transport and mechanical properties
著者:: Murphy, J, 等
出版事項: (2006) -
The influence of nitrogen on dislocation locking in float-zone silicon
著者:: Murphy, J, 等
出版事項: (2005) -
The influence of nitrogen on dislocation locking in float-zone silicon
著者:: Murphy, J, 等
出版事項: (2005) -
Out-diffusion of nitrogen from float-zone silicon measured by dislocation locking
著者:: Alpass, C, 等
出版事項: (2007)