Nitrogen-doped silicon: Mechanical, transport and electrical properties
A novel dislocation locking technique is used to study the behaviour of nitrogen in float-zone silicon (FZ-Si). Specimens containing well-defined arrays of dislocation half-loops are subjected to isothermal anneals of controlled duration, during which nitrogen diffuses to the dislocations. The stres...
Үндсэн зохиолчид: | Murphy, J, Alpass, C, Giannattasio, A, Senkader, S, Emiroglu, D, Evans-Freeman, J, Falster, R, Wilshaw, P |
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Формат: | Journal article |
Хэл сонгох: | English |
Хэвлэсэн: |
2006
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