Murphy, J., Bothe, K., Voronkov, V., & Falster, R. (2013). On the mechanism of recombination at oxide precipitates in silicon.
Chicago Style (17. basım) AtıfMurphy, J., K. Bothe, V. Voronkov, ve R. Falster. On the Mechanism of Recombination at Oxide Precipitates in Silicon. 2013.
MLA (9th ed.) AtıfMurphy, J., et al. On the Mechanism of Recombination at Oxide Precipitates in Silicon. 2013.
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