CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY
Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composi...
| Main Authors: | , , , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
1989
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| _version_ | 1797081573030363136 |
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| author | Grundy, M Richardson, R Roser, S Beamson, G Brennan, W Howard, J Oneil, M Penfold, J Shackleton, C Ward, R |
| author_facet | Grundy, M Richardson, R Roser, S Beamson, G Brennan, W Howard, J Oneil, M Penfold, J Shackleton, C Ward, R |
| author_sort | Grundy, M |
| collection | OXFORD |
| description | Thin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements. © 1989. |
| first_indexed | 2024-03-07T01:16:09Z |
| format | Journal article |
| id | oxford-uuid:8ec3bdce-4dbd-4ce4-bc76-831482222fd1 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-07T01:16:09Z |
| publishDate | 1989 |
| record_format | dspace |
| spelling | oxford-uuid:8ec3bdce-4dbd-4ce4-bc76-831482222fd12022-03-26T22:59:45ZCHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITYJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:8ec3bdce-4dbd-4ce4-bc76-831482222fd1EnglishSymplectic Elements at Oxford1989Grundy, MRichardson, RRoser, SBeamson, GBrennan, WHoward, JOneil, MPenfold, JShackleton, CWard, RThin films (less than 2000 Å) of amorphous hydrogenated carbon have been characterized by neutron reflectivity measurements. Films were deposited onto silicon substrates from a methane r.f. plasma to produce both very hard and very soft materials. The critical angle and density give the film composition (CH0.55±0.05 hard film, CH0.78±0.08 soft film). Fitting the interference pattern to a model gives the film thickness and a measure of the extent of mixing at the silicon-carbon interface. A structural model for plasma-deposited carbon films is used to correlate film composition with plasma deposition conditions and optical band gap measurements. © 1989. |
| spellingShingle | Grundy, M Richardson, R Roser, S Beamson, G Brennan, W Howard, J Oneil, M Penfold, J Shackleton, C Ward, R CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title | CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title_full | CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title_fullStr | CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title_full_unstemmed | CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title_short | CHARACTERIZATION OF PLASMA-DEPOSITED AMORPHOUS HYDROGENATED CARBON-FILMS BY NEUTRON REFLECTIVITY |
| title_sort | characterization of plasma deposited amorphous hydrogenated carbon films by neutron reflectivity |
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