Data in support of Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition

Data in support of Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition

All data reported in publication: Impact of precursor dosing on the surface passivation of AZO/AlOx stacks formed using atomic layer deposition

Бібліографічні деталі
Автори: Wang, Y, Hobson, T, Swallow, J, McNab, S, O'Sullivan, J, Soeriyadi, A, Niu, X, Fraser, R, Dasgupta, A, Maitra, S, Altermatt, P, Weatherup, R, Wright, M, Bonilla, RS
Формат: Dataset
Мова:English
Опубліковано: University of Oxford 2025

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