Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.
توثيق أسلوب شيكاغو (الطبعة السابعة عشر)Hesjedal, T., و W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
توثيق جمعية اللغة المعاصرة MLA (الإصدار التاسع)Hesjedal, T., و W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.