Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.
Chicago-Zitierstil (17. Ausg.)Hesjedal, T., und W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
MLA-Zitierstil (9. Ausg.)Hesjedal, T., und W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
Achtung: Diese Zitate sind unter Umständen nicht zu 100% korrekt.