Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.
Chicago Style aipamenaHesjedal, T., and W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
MLA aipamenaHesjedal, T., and W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
Kontuz: berrikusi erreferentzia hauek erabili aurretik.