APA(7版)引用形式

Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.

Chicagoスタイル(17版)引用形式

Hesjedal, T., , W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.

MLA(9版)引用形式

Hesjedal, T., , W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.

警告: この引用は必ずしも正確ではありません.