Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.
Citação norma ChicagoHesjedal, T., and W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
Citação norma MLAHesjedal, T., and W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.