Стиль цитування APA (7-ме видання)

Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.

Чикаго стиль цитування (17-те видання)

Hesjedal, T., та W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.

Стиль цитування MLA (9-ме видання)

Hesjedal, T., та W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.