Hesjedal, T., & Seidel, W. (2003). Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers.
芝加哥风格引文Hesjedal, T., 与 W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
MLA引文Hesjedal, T., 与 W. Seidel. Near-field Elastomeric Mask Photolithography Fabrication of High-frequency Surface Acoustic Wave Transducers. 2003.
警告：这些引文格式不一定是100％准确.