Near-field elastomeric mask photolithography fabrication of high-frequency surface acoustic wave transducers
Optical lithography is the method of choice for mass production of electronic as well as acoustic devices. Cost issues, in particular, make it superior over slow but high-resolution methods, such as electron beam lithography. Also, its applicability for nonconductive substrates is an important featu...
Հիմնական հեղինակներ: | Hesjedal, T, Seidel, W |
---|---|
Ձևաչափ: | Journal article |
Լեզու: | English |
Հրապարակվել է: |
2003
|
Նմանատիպ նյութեր
-
Near-field phase shift photolithography for high-frequency SAW transducers
: Hesjedal, T, և այլն
Հրապարակվել է: (2002) -
Near-field sub-diffraction photolithography with an elastomeric photomask
: Sangyoon Paik, և այլն
Հրապարակվել է: (2020-02-01) -
Multi-frequency and multi-mode GHz surface acoustic wave sensor
: Seidel, W, և այլն
Հրապարակվել է: (2003) -
Surface-acoustic-wave transducers for the extremely-high-frequency range using AlN/SiC(0001)
: Takagaki, Y, և այլն
Հրապարակվել է: (2004) -
AFM observation of surface acoustic waves emitted from single symmetric SAW transducers.
: Hesjedal, T, և այլն
Հրապարակվել է: (2001)