Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features

There have been many successful attempts to grow high-quality large-area graphene on flat substrates. Doing so at the nanoscale has thus far been plagued by significant scalability problems, particularly because of the need for delicate transfer processes onto predefined features, which are necessar...

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Main Authors: Pacios, M, Hosseini, P, Fan, Y, He, Z, Krause, O, Hutchison, J, Warner, J, Bhaskaran, H
Format: Journal article
Published: Nature Publishing Group 2016
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author Pacios, M
Hosseini, P
Fan, Y
He, Z
Krause, O
Hutchison, J
Warner, J
Bhaskaran, H
author_facet Pacios, M
Hosseini, P
Fan, Y
He, Z
Krause, O
Hutchison, J
Warner, J
Bhaskaran, H
author_sort Pacios, M
collection OXFORD
description There have been many successful attempts to grow high-quality large-area graphene on flat substrates. Doing so at the nanoscale has thus far been plagued by significant scalability problems, particularly because of the need for delicate transfer processes onto predefined features, which are necessarily low-yield processes and which can introduce undesirable residues. Herein we describe a highly scalable, clean and effective, in-situ method that uses thin film deposition techniques to directly grow on a continuous basis ultrathin graphite (uG) on uneven nanoscale surfaces. We then demonstrate that this is possible on a model system of atomic force probe tips of various radii. Further, we characterize the growth characteristics of this technique as well as the film’s superior conduction and lower adhesion at these scales. This sets the stage for such a process to allow the use of highly functional graphite in high-aspect-ratio nanoscale components.
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spelling oxford-uuid:9176fa67-1bcb-47ae-a3d2-3eb3bed743ba2022-03-26T23:18:54ZDirect manufacturing of ultrathin graphite on three-dimensional nanoscale featuresJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:9176fa67-1bcb-47ae-a3d2-3eb3bed743baSymplectic Elements at OxfordNature Publishing Group2016Pacios, MHosseini, PFan, YHe, ZKrause, OHutchison, JWarner, JBhaskaran, HThere have been many successful attempts to grow high-quality large-area graphene on flat substrates. Doing so at the nanoscale has thus far been plagued by significant scalability problems, particularly because of the need for delicate transfer processes onto predefined features, which are necessarily low-yield processes and which can introduce undesirable residues. Herein we describe a highly scalable, clean and effective, in-situ method that uses thin film deposition techniques to directly grow on a continuous basis ultrathin graphite (uG) on uneven nanoscale surfaces. We then demonstrate that this is possible on a model system of atomic force probe tips of various radii. Further, we characterize the growth characteristics of this technique as well as the film’s superior conduction and lower adhesion at these scales. This sets the stage for such a process to allow the use of highly functional graphite in high-aspect-ratio nanoscale components.
spellingShingle Pacios, M
Hosseini, P
Fan, Y
He, Z
Krause, O
Hutchison, J
Warner, J
Bhaskaran, H
Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title_full Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title_fullStr Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title_full_unstemmed Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title_short Direct manufacturing of ultrathin graphite on three-dimensional nanoscale features
title_sort direct manufacturing of ultrathin graphite on three dimensional nanoscale features
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