Metal-insulator-metal plasmonic colour filters for CMOS image sensor applications

<p>Significant improvement in using plasmonic nanostructures for practical colour filtering and multispectral imaging applications is achieved by exploiting the coupling of surface plasmon polaritons with dielectric optical cavity resonances within a hexagonal array of subwavelength holes in a...

Disgrifiad llawn

Manylion Llyfryddiaeth
Prif Awdur: Pinton, N
Awduron Eraill: Collins, S
Fformat: Traethawd Ymchwil
Iaith:English
Cyhoeddwyd: 2020
Pynciau:
Disgrifiad
Crynodeb:<p>Significant improvement in using plasmonic nanostructures for practical colour filtering and multispectral imaging applications is achieved by exploiting the coupling of surface plasmon polaritons with dielectric optical cavity resonances within a hexagonal array of subwavelength holes in a thin CMOS-compatible metal-insulator-metal (MIM) stack. This architecture overcomes the limitations of all previously reported plasmonic colour filters, namely poor transmission and broad band-pass characteristic, effectively providing a compact approach to selectively filter light. The physical insights established from the electromagnetic near-field patterns and parametric simulation studies are used to accurately tailor the optical properties of the filters. </p> <p>Measured transmission efficiencies up to 60% and full-width at half-maximum between 45 nm and 55 nm along the entire visible spectrum are achieved - an impressive and unique combination of features that has never been reported before. The non-ideality of the fabrication at the nanoscale is addressed, the issues encountered highlighted and alternative solutions proposed and verified, demonstrating that the working principle of the MIM structure can be successfully extended to other materials and structural parameters.</p>