Broad ion beam milling of focused ion beam prepared transmission electron microscopy cross-section specimens for high resolution electron microscopy using silicon support membranes
The use of focused ion beam systems is becoming routine for the preparation of site specific TEM cross-section specimens which are typically 50-100 nm. thick. Generally, the cross-sections are milled using a 30 keV ion beam, which unfortunately, can result in large amounts of damage to the sidewalls...
| Main Authors: | , , , |
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| 格式: | Conference item |
| 出版: |
2001
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