Growth and investigation of epitaxial semiconductor films
<p>The work described in this thesis is concerned with the growth and examination of thin Si and Ge films. These were deposited by sublimation and evaporation techniques in UHV, using apparatus constructed by the author, The source of deposited material was heated by electron bombardment, whil...
Үндсэн зохиолч: | Cullis, A |
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Формат: | Дипломын ажил |
Хэвлэсэн: |
1972
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Ижил төстэй зүйлс
Chemical Beam Epitaxy of Compound Semiconductors
-н: Kolodziejski, Leslie A., зэрэг
Хэвлэсэн: (2010)
-н: Kolodziejski, Leslie A., зэрэг
Хэвлэсэн: (2010)
Ижил төстэй зүйлс
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Epitaxial Growth and Processing of Compound Semiconductors
-н: Kolodziejski, Leslie A., зэрэг
Хэвлэсэн: (2010) -
Epitaxial Growth and Processing of Compound Semiconductors
-н: Kolodziejski, Leslie A., зэрэг
Хэвлэсэн: (2010) -
On the growth of semiconductor-based epitaxial and oxide films from low energy ion beams
-н: Vancauwenberghe, Olivier P. J.
Хэвлэсэн: (2023) -
The Epitaxial Growth of Ge and GeSn Semiconductor Thin Films on C-Plane Sapphire
-н: Emmanuel Wangila, зэрэг
Хэвлэсэн: (2024-04-01) -
REACTION MODELS FOR THE EPITAXIAL-GROWTH OF III-V SEMICONDUCTORS BY CHEMICAL BEAM EPITAXY
-н: Foord, J, зэрэг
Хэвлэсэн: (1993)