Non lithographic technique for the production of large area high density gridded field emission sources
We report a novel method for the production of high density arrays of gridded microtip field emission electron sources. The microporous structure of Al2O3, formed by anodization of Aluminum, is exploited to provide a high density (109 sites cm-2) of sites for emitter fabrication without the need for...
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| Format: | Conference item |
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IEEE
1998
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| _version_ | 1797083230298439680 |
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| author | Holland, E Harrison, M Huang, M Wilshaw, P |
| author_facet | Holland, E Harrison, M Huang, M Wilshaw, P |
| author_sort | Holland, E |
| collection | OXFORD |
| description | We report a novel method for the production of high density arrays of gridded microtip field emission electron sources. The microporous structure of Al2O3, formed by anodization of Aluminum, is exploited to provide a high density (109 sites cm-2) of sites for emitter fabrication without the need for individual lithographic patterning of each emitter. The small size of the resultant emitters enables operation with only moderate extraction voltage (20-50 V). Tests of groups of ≈400,000 emitters have demonstrated emission current densities suitable for display applications. |
| first_indexed | 2024-03-07T01:38:46Z |
| format | Conference item |
| id | oxford-uuid:961e95bb-8e16-4490-95ae-65584862f0f2 |
| institution | University of Oxford |
| last_indexed | 2024-03-07T01:38:46Z |
| publishDate | 1998 |
| publisher | IEEE |
| record_format | dspace |
| spelling | oxford-uuid:961e95bb-8e16-4490-95ae-65584862f0f22022-03-26T23:50:51ZNon lithographic technique for the production of large area high density gridded field emission sourcesConference itemhttp://purl.org/coar/resource_type/c_5794uuid:961e95bb-8e16-4490-95ae-65584862f0f2Symplectic Elements at OxfordIEEE1998Holland, EHarrison, MHuang, MWilshaw, PWe report a novel method for the production of high density arrays of gridded microtip field emission electron sources. The microporous structure of Al2O3, formed by anodization of Aluminum, is exploited to provide a high density (109 sites cm-2) of sites for emitter fabrication without the need for individual lithographic patterning of each emitter. The small size of the resultant emitters enables operation with only moderate extraction voltage (20-50 V). Tests of groups of ≈400,000 emitters have demonstrated emission current densities suitable for display applications. |
| spellingShingle | Holland, E Harrison, M Huang, M Wilshaw, P Non lithographic technique for the production of large area high density gridded field emission sources |
| title | Non lithographic technique for the production of large area high density gridded field emission sources |
| title_full | Non lithographic technique for the production of large area high density gridded field emission sources |
| title_fullStr | Non lithographic technique for the production of large area high density gridded field emission sources |
| title_full_unstemmed | Non lithographic technique for the production of large area high density gridded field emission sources |
| title_short | Non lithographic technique for the production of large area high density gridded field emission sources |
| title_sort | non lithographic technique for the production of large area high density gridded field emission sources |
| work_keys_str_mv | AT hollande nonlithographictechniquefortheproductionoflargeareahighdensitygriddedfieldemissionsources AT harrisonm nonlithographictechniquefortheproductionoflargeareahighdensitygriddedfieldemissionsources AT huangm nonlithographictechniquefortheproductionoflargeareahighdensitygriddedfieldemissionsources AT wilshawp nonlithographictechniquefortheproductionoflargeareahighdensitygriddedfieldemissionsources |