Dislocation locking in silicon by oxygen and oxygen transport at low temperatures
Dislocation-oxygen interactions in silicon have been studied experimentally and using numerical modelling. Experiments were performed to understand the locking of dislocations by oxygen and to measure the unlocking stress of dislocations in the temperature range 350-900degreesC for different anneali...
Main Authors: | Senkader, S, Giannattasio, A, Falster, R, Wilshaw, P |
---|---|
פורמט: | Conference item |
יצא לאור: |
Trans Tech Publications Ltd
2004
|
פריטים דומים
-
Dislocation locking by oxygen in silicon: New insights to oxygen diffusion at low temperatures
מאת: Senkader, S, et al.
יצא לאור: (2002) -
Oxygen and nitrogen transport in silicon investigated by dislocation locking experiments
מאת: Giannattasio, A, et al.
יצא לאור: (2005) -
Oxygen-dislocation interactions in silicon at temperatures below 700 degrees C: Dislocation locking and oxygen diffusion
מאת: Senkader, S, et al.
יצא לאור: (2001) -
Locking of dislocations by oxygen in Cz-silicon
מאת: Senkader, S, et al.
יצא לאור: (1999) -
On the locking of dislocations by oxygen in silicon
מאת: Senkader, S, et al.
יצא לאור: (2001)