Dislocation locking in silicon by oxygen and oxygen transport at low temperatures
Dislocation-oxygen interactions in silicon have been studied experimentally and using numerical modelling. Experiments were performed to understand the locking of dislocations by oxygen and to measure the unlocking stress of dislocations in the temperature range 350-900degreesC for different anneali...
Հիմնական հեղինակներ: | Senkader, S, Giannattasio, A, Falster, R, Wilshaw, P |
---|---|
Ձևաչափ: | Conference item |
Հրապարակվել է: |
Trans Tech Publications Ltd
2004
|
Նմանատիպ նյութեր
-
Dislocation locking by oxygen in silicon: New insights to oxygen diffusion at low temperatures
: Senkader, S, և այլն
Հրապարակվել է: (2002) -
Oxygen and nitrogen transport in silicon investigated by dislocation locking experiments
: Giannattasio, A, և այլն
Հրապարակվել է: (2005) -
Oxygen-dislocation interactions in silicon at temperatures below 700 degrees C: Dislocation locking and oxygen diffusion
: Senkader, S, և այլն
Հրապարակվել է: (2001) -
Locking of dislocations by oxygen in Cz-silicon
: Senkader, S, և այլն
Հրապարակվել է: (1999) -
On the locking of dislocations by oxygen in silicon
: Senkader, S, և այլն
Հրապարակվել է: (2001)