Carbon nanotube nanoelectronic devices compatible with transmission electron microscopy

We report on a novel method to fabricate carbon nanotube (CNT) nanoelectronic devices on silicon nitride membrane grids that are compatible with high resolution transmission electron microscopy (HRTEM). Resist-based electron beam lithography is used to fabricate electrodes on 50nm thin silicon nitri...

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Detalhes bibliográficos
Principais autores: Wang, H, Luo, J, Schäffel, F, Rümmeli, M, Briggs, G, Warner, J
Formato: Journal article
Idioma:English
Publicado em: 2011