Field-ion specimen preparation using focused ion-beam milling

Preparation of field-ion specimens from various materials has been accomplished using focused ion-beam milling in either a simple cutting mode or by application of an annular-shaped ion-milling pattern. These specimens have been investigated using field-ion microscopy and three-dimensional atom prob...

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Main Authors: Larson, D, Foord, D, Petford-Long, A, Liew, H, Blamire, MG, Cerezo, A, Smith, G
Format: Conference item
Published: 1999
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author Larson, D
Foord, D
Petford-Long, A
Liew, H
Blamire, MG
Cerezo, A
Smith, G
author_facet Larson, D
Foord, D
Petford-Long, A
Liew, H
Blamire, MG
Cerezo, A
Smith, G
author_sort Larson, D
collection OXFORD
description Preparation of field-ion specimens from various materials has been accomplished using focused ion-beam milling in either a simple cutting mode or by application of an annular-shaped ion-milling pattern. These specimens have been investigated using field-ion microscopy and three-dimensional atom probe analysis. In the cutting mode, gallium implantation is minimised when using a lower beam energy. However, with annular milling, using 30 keV ions opposed to 10 keV ions results in less gallium implantation and produces a smaller shank angle and a sharper apex radius. High-dose ion imaging at 30 keV ion energy, even with relatively low beam currents, results in excessive implantation during held-ion specimen fabrication. Focused ion-beam milling provides not only an alternative method of field-ion sample preparation, but also, in conjunction with atom probe analysis, allows the quantitative investigation of the gallium implantation and damage which occurs during the milling. (C) 1999 Elsevier Science B.V. All rights reserved.
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spelling oxford-uuid:b2105bfa-7826-49a7-9b00-a46b75fe9db52022-03-27T04:09:02ZField-ion specimen preparation using focused ion-beam millingConference itemhttp://purl.org/coar/resource_type/c_5794uuid:b2105bfa-7826-49a7-9b00-a46b75fe9db5Symplectic Elements at Oxford1999Larson, DFoord, DPetford-Long, ALiew, HBlamire, MGCerezo, ASmith, GPreparation of field-ion specimens from various materials has been accomplished using focused ion-beam milling in either a simple cutting mode or by application of an annular-shaped ion-milling pattern. These specimens have been investigated using field-ion microscopy and three-dimensional atom probe analysis. In the cutting mode, gallium implantation is minimised when using a lower beam energy. However, with annular milling, using 30 keV ions opposed to 10 keV ions results in less gallium implantation and produces a smaller shank angle and a sharper apex radius. High-dose ion imaging at 30 keV ion energy, even with relatively low beam currents, results in excessive implantation during held-ion specimen fabrication. Focused ion-beam milling provides not only an alternative method of field-ion sample preparation, but also, in conjunction with atom probe analysis, allows the quantitative investigation of the gallium implantation and damage which occurs during the milling. (C) 1999 Elsevier Science B.V. All rights reserved.
spellingShingle Larson, D
Foord, D
Petford-Long, A
Liew, H
Blamire, MG
Cerezo, A
Smith, G
Field-ion specimen preparation using focused ion-beam milling
title Field-ion specimen preparation using focused ion-beam milling
title_full Field-ion specimen preparation using focused ion-beam milling
title_fullStr Field-ion specimen preparation using focused ion-beam milling
title_full_unstemmed Field-ion specimen preparation using focused ion-beam milling
title_short Field-ion specimen preparation using focused ion-beam milling
title_sort field ion specimen preparation using focused ion beam milling
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AT petfordlonga fieldionspecimenpreparationusingfocusedionbeammilling
AT liewh fieldionspecimenpreparationusingfocusedionbeammilling
AT blamiremg fieldionspecimenpreparationusingfocusedionbeammilling
AT cerezoa fieldionspecimenpreparationusingfocusedionbeammilling
AT smithg fieldionspecimenpreparationusingfocusedionbeammilling