Stress-assisted thermal diffusion barrier breakdown in ion beam deposited Cu/W nano-multilayers on Si substrate observed by in Situ GISAXS and transmission EDX
The thermal stability of Cu/W nano-multilayers deposited on a Si substrate using ion beam deposition was analyzed in situ by GISAXS and transmission EDX—a combination of methods permitting the observation of diffusion processes within buried layers. Further supporting techniques such as XRR, TEM, WA...
| Egile Nagusiak: | , , , , , |
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| Formatua: | Journal article |
| Hizkuntza: | English |
| Argitaratua: |
American Chemical Society
2021
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