First principles study of GeSi exchange mechanisms at the Si(001) surface

Based on density functional theory calculations, we show that an isolated Ge adatom on Si(001) triggers an exchange mechanism involving three atoms, which leads to the formation of a Si adatom and a mixed SiGe surface dimer. The activation energy calculated from first principles is sufficiently low...

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Автори: Zipoli, F, Cereda, S, Ceriotti, M, Bernasconi, M, Miglio, L, Montalenti, F
Формат: Journal article
Мова:English
Опубліковано: 2008
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author Zipoli, F
Cereda, S
Ceriotti, M
Bernasconi, M
Miglio, L
Montalenti, F
author_facet Zipoli, F
Cereda, S
Ceriotti, M
Bernasconi, M
Miglio, L
Montalenti, F
author_sort Zipoli, F
collection OXFORD
description Based on density functional theory calculations, we show that an isolated Ge adatom on Si(001) triggers an exchange mechanism involving three atoms, which leads to the formation of a Si adatom and a mixed SiGe surface dimer. The activation energy calculated from first principles is sufficiently low (0.8 eV) to make such a process viable down to the lowest temperature (330 K) at which intermixing was reported. A second mechanism, with a higher barrier, is also proposed and shown to possibly contribute to the incorporation of Ge into deeper layers as experimentally observed at higher temperatures. © 2008 American Institute of Physics.
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spelling oxford-uuid:b6991c31-462c-46d2-b6e9-c5e80aacd0d42022-03-27T04:42:01ZFirst principles study of GeSi exchange mechanisms at the Si(001) surfaceJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:b6991c31-462c-46d2-b6e9-c5e80aacd0d4EnglishSymplectic Elements at Oxford2008Zipoli, FCereda, SCeriotti, MBernasconi, MMiglio, LMontalenti, FBased on density functional theory calculations, we show that an isolated Ge adatom on Si(001) triggers an exchange mechanism involving three atoms, which leads to the formation of a Si adatom and a mixed SiGe surface dimer. The activation energy calculated from first principles is sufficiently low (0.8 eV) to make such a process viable down to the lowest temperature (330 K) at which intermixing was reported. A second mechanism, with a higher barrier, is also proposed and shown to possibly contribute to the incorporation of Ge into deeper layers as experimentally observed at higher temperatures. © 2008 American Institute of Physics.
spellingShingle Zipoli, F
Cereda, S
Ceriotti, M
Bernasconi, M
Miglio, L
Montalenti, F
First principles study of GeSi exchange mechanisms at the Si(001) surface
title First principles study of GeSi exchange mechanisms at the Si(001) surface
title_full First principles study of GeSi exchange mechanisms at the Si(001) surface
title_fullStr First principles study of GeSi exchange mechanisms at the Si(001) surface
title_full_unstemmed First principles study of GeSi exchange mechanisms at the Si(001) surface
title_short First principles study of GeSi exchange mechanisms at the Si(001) surface
title_sort first principles study of gesi exchange mechanisms at the si 001 surface
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