GETTERING OF COPPER IN SILICON - PRECIPITATION AT EXTENDED SURFACE-DEFECTS

Selected results from a TEM study of copper precipitation at extended surface defects in silicon are reported. The relative getting effectiveness of surface pits, oxidation induced stacking faults, and their bounding partials is compared. Copper-silicide precipitate colonies on {111} planes are obse...

תיאור מלא

מידע ביבליוגרפי
Main Authors: Decoteau, M, Wilshaw, P, Falster, R
פורמט: Journal article
שפה:English
יצא לאור: Publ by Inst of Physics Publ Ltd 1991