High vertical yield InP nanowire growth on Si(111) using a thin buffer layer.
We demonstrate the growth of InP nanowires on Si(111) using a thin InP buffer layer. The buffer layer is grown using a two-step procedure. The initial layer formation is ensured by using a very low growth temperature. An extremely high V/III ratio is necessary to prevent In droplet formation at this...
Κύριοι συγγραφείς: | Fonseka, H, Tan, H, Wong-Leung, J, Kang, J, Parkinson, P, Jagadish, C |
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Μορφή: | Journal article |
Γλώσσα: | English |
Έκδοση: |
2013
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Παρόμοια τεκμήρια
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