High vertical yield InP nanowire growth on Si(111) using a thin buffer layer.
We demonstrate the growth of InP nanowires on Si(111) using a thin InP buffer layer. The buffer layer is grown using a two-step procedure. The initial layer formation is ensured by using a very low growth temperature. An extremely high V/III ratio is necessary to prevent In droplet formation at this...
Main Authors: | Fonseka, H, Tan, H, Wong-Leung, J, Kang, J, Parkinson, P, Jagadish, C |
---|---|
格式: | Journal article |
语言: | English |
出版: |
2013
|
相似书籍
-
Growth of InP nanowires on silicon using a thin buffer layer
由: Fonseka, H, et al.
出版: (2012) -
Growth of InP nanowires on silicon using a thin buffer layer
由: Fonseka, H. Aruni, et al.
出版: (2012) -
InP nanowires grown by SA-MOVPE
由: Gao, Q, et al.
出版: (2012) -
Vertically oriented epitaxial germanium nanowires on silicon substrates using thin germanium buffer layers
由: Jung, J, et al.
出版: (2010) -
Engineering the Side Facets of Vertical [100] Oriented InP Nanowires for Novel Radial Heterostructures
由: H. Aruni Fonseka, et al.
出版: (2019-12-01)