APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE.
The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD d...
| 主要な著者: | , |
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| フォーマット: | Journal article |
| 言語: | English |
| 出版事項: |
Les Editions de Physique
1986
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| 要約: | The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD deposits, W metallisation from WF//6 vapour and photo-enhanced etching. |
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