APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE.
The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD d...
| Main Authors: | , |
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| 格式: | Journal article |
| 語言: | English |
| 出版: |
Les Editions de Physique
1986
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| _version_ | 1826295822101250048 |
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| author | Jackman, R Foord, J |
| author_facet | Jackman, R Foord, J |
| author_sort | Jackman, R |
| collection | OXFORD |
| description | The applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD deposits, W metallisation from WF//6 vapour and photo-enhanced etching. |
| first_indexed | 2024-03-07T04:06:55Z |
| format | Journal article |
| id | oxford-uuid:c67d1fb4-ddd8-47a0-a7f7-a160b65d05c7 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-07T04:06:55Z |
| publishDate | 1986 |
| publisher | Les Editions de Physique |
| record_format | dspace |
| spelling | oxford-uuid:c67d1fb4-ddd8-47a0-a7f7-a160b65d05c72022-03-27T06:38:26ZAPPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE.Journal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:c67d1fb4-ddd8-47a0-a7f7-a160b65d05c7EnglishSymplectic Elements at OxfordLes Editions de Physique1986Jackman, RFoord, JThe applications of surface sensitive techniques to chemical problems arising in photochemical processing are considered. Both their use in ex situ and in situ modes are described. Results for three photochemical processes are presented dealing with the chemical origins of periodic ripples in LCVD deposits, W metallisation from WF//6 vapour and photo-enhanced etching. |
| spellingShingle | Jackman, R Foord, J APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title | APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title_full | APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title_fullStr | APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title_full_unstemmed | APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title_short | APPLICATIONS OF SURFACE SENSITIVE TECHNIQUES IN THE STUDY OF PHOTOCHEMICAL PROCESSING AT THE SOLID-GAS INTERFACE. |
| title_sort | applications of surface sensitive techniques in the study of photochemical processing at the solid gas interface |
| work_keys_str_mv | AT jackmanr applicationsofsurfacesensitivetechniquesinthestudyofphotochemicalprocessingatthesolidgasinterface AT foordj applicationsofsurfacesensitivetechniquesinthestudyofphotochemicalprocessingatthesolidgasinterface |