Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond

Nanofilm deposits of a porous Sn(IV) oxide are formed by anodic electrodeposition on a polished boron-doped diamond electrode immersed in an aqueous Sn2+ solution. Mechanically and electrochemically stable deposits of 10-15 nm thickness are formed irrespective of the Sn2+ concentration and mass-tran...

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Main Authors: Hyde, M, Saterlay, A, Wilkins, S, Foord, J, Compton, R, Marken, F
Format: Journal article
Language:English
Published: 2002
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author Hyde, M
Saterlay, A
Wilkins, S
Foord, J
Compton, R
Marken, F
author_facet Hyde, M
Saterlay, A
Wilkins, S
Foord, J
Compton, R
Marken, F
author_sort Hyde, M
collection OXFORD
description Nanofilm deposits of a porous Sn(IV) oxide are formed by anodic electrodeposition on a polished boron-doped diamond electrode immersed in an aqueous Sn2+ solution. Mechanically and electrochemically stable deposits of 10-15 nm thickness are formed irrespective of the Sn2+ concentration and mass-transport enhancement by power ultrasound. Atomic force microscopy images indicate the presence of a smooth and noncrystalline film, which is stable under ambient conditions. n-type semiconducting characteristics are observed for the aqueous solution redox couples Fe(CN)63-/4- and Ru(NH3)63+/2+. However, preliminary results from voltammetric experiments indicate that the small and neutral organic molecule N,N,N′,N′-tetramethylphenylenediamine is able to diffuse through the porous film to undergo oxidation directly at the surface of the boron-doped diamond electrode.
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spelling oxford-uuid:cec4ccd4-1d07-4455-9bb1-3f3eba99b2d22022-03-27T07:37:57ZDeposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamondJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:cec4ccd4-1d07-4455-9bb1-3f3eba99b2d2EnglishSymplectic Elements at Oxford2002Hyde, MSaterlay, AWilkins, SFoord, JCompton, RMarken, FNanofilm deposits of a porous Sn(IV) oxide are formed by anodic electrodeposition on a polished boron-doped diamond electrode immersed in an aqueous Sn2+ solution. Mechanically and electrochemically stable deposits of 10-15 nm thickness are formed irrespective of the Sn2+ concentration and mass-transport enhancement by power ultrasound. Atomic force microscopy images indicate the presence of a smooth and noncrystalline film, which is stable under ambient conditions. n-type semiconducting characteristics are observed for the aqueous solution redox couples Fe(CN)63-/4- and Ru(NH3)63+/2+. However, preliminary results from voltammetric experiments indicate that the small and neutral organic molecule N,N,N′,N′-tetramethylphenylenediamine is able to diffuse through the porous film to undergo oxidation directly at the surface of the boron-doped diamond electrode.
spellingShingle Hyde, M
Saterlay, A
Wilkins, S
Foord, J
Compton, R
Marken, F
Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title_full Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title_fullStr Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title_full_unstemmed Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title_short Deposition and characterisation of a porous Sn(IV) semiconductor nanofilm on boron-doped diamond
title_sort deposition and characterisation of a porous sn iv semiconductor nanofilm on boron doped diamond
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