Imaging localized energy states in silicon-doped InGaN nanowires using 4D electron microscopy

Introducing dopants into InGaN NWs is known to significantly improve their device performances through a variety of mechanisms. However, to further optimize device operation under the influence of large specific surfaces, thorough knowledge of ultrafast dynamical processes at the surface and interfa...

詳細記述

書誌詳細
主要な著者: Bose, R, Adhikari, A, Burlakov, V, Liu, G, Haque, M, Priante, D, Hedhili, M, Wehbe, N, Zhao, C, Yang, H, Ng, T, Goriely, A, Bakr, O, Wu, T, Ooi, B, Mohammed, O
フォーマット: Journal article
出版事項: American Chemical Society 2018