Electrical percolation through a discontinuous Au nanoparticle film
Au thin films of thicknesses ranging from 5 to 20 nm were grown in UHV through physical vapour deposition on glass substrates decorated with Pt interdigitated electrodes with 5 lm separation. As expected, a gradual decrease in the electrical resistance of the films was observed as growth proceeded;...
| Main Authors: | , , , |
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| Format: | Journal article |
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AIP Publishing
2018
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| _version_ | 1797097583920807936 |
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| author | Lefferts, M Murugappan, K Wu, C Castell, M |
| author_facet | Lefferts, M Murugappan, K Wu, C Castell, M |
| author_sort | Lefferts, M |
| collection | OXFORD |
| description | Au thin films of thicknesses ranging from 5 to 20 nm were grown in UHV through physical vapour deposition on glass substrates decorated with Pt interdigitated electrodes with 5 lm separation. As expected, a gradual decrease in the electrical resistance of the films was observed as growth proceeded; however, when the average film thickness was greater than around 11 nm, the resistance decrease was not smooth but occurred in discrete steps. These resistance steps are attributed to the formation of electrical percolation pathways connecting the electrodes. The samples were then annealed at temperatures between 200 C and 500 C for periods of 1 to 22 h with the aim of producing insulating nanoparticle films. Dewetting of the Au films produces nanoparticles whose size and separation depend on annealing temperature and time, as well as the initial thickness of the Au film. The complex electrical resistance behaviour of the film was also monitored during the dewetting process. |
| first_indexed | 2024-03-07T04:57:39Z |
| format | Journal article |
| id | oxford-uuid:d725dee9-c1ab-4f1c-9f39-673973ff417c |
| institution | University of Oxford |
| last_indexed | 2024-03-07T04:57:39Z |
| publishDate | 2018 |
| publisher | AIP Publishing |
| record_format | dspace |
| spelling | oxford-uuid:d725dee9-c1ab-4f1c-9f39-673973ff417c2022-03-27T08:39:02ZElectrical percolation through a discontinuous Au nanoparticle filmJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:d725dee9-c1ab-4f1c-9f39-673973ff417cSymplectic Elements at OxfordAIP Publishing2018Lefferts, MMurugappan, KWu, CCastell, MAu thin films of thicknesses ranging from 5 to 20 nm were grown in UHV through physical vapour deposition on glass substrates decorated with Pt interdigitated electrodes with 5 lm separation. As expected, a gradual decrease in the electrical resistance of the films was observed as growth proceeded; however, when the average film thickness was greater than around 11 nm, the resistance decrease was not smooth but occurred in discrete steps. These resistance steps are attributed to the formation of electrical percolation pathways connecting the electrodes. The samples were then annealed at temperatures between 200 C and 500 C for periods of 1 to 22 h with the aim of producing insulating nanoparticle films. Dewetting of the Au films produces nanoparticles whose size and separation depend on annealing temperature and time, as well as the initial thickness of the Au film. The complex electrical resistance behaviour of the film was also monitored during the dewetting process. |
| spellingShingle | Lefferts, M Murugappan, K Wu, C Castell, M Electrical percolation through a discontinuous Au nanoparticle film |
| title | Electrical percolation through a discontinuous Au nanoparticle film |
| title_full | Electrical percolation through a discontinuous Au nanoparticle film |
| title_fullStr | Electrical percolation through a discontinuous Au nanoparticle film |
| title_full_unstemmed | Electrical percolation through a discontinuous Au nanoparticle film |
| title_short | Electrical percolation through a discontinuous Au nanoparticle film |
| title_sort | electrical percolation through a discontinuous au nanoparticle film |
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