Studies on etching and polymer deposition in halocarbon plasmas
<p>Plasma etching, the selective removal of materials by reaction with chemically active species formed in a glow-discharge, is widely used by the electronics industry because of the advantages over 'wet' processes. The full potential has yet to be realised because chemical processe...
| Автори: | , |
|---|---|
| Інші автори: | |
| Формат: | Дисертація |
| Мова: | English |
| Опубліковано: |
1987
|
| Предмети: |