Potassium ions in SiO2: electrets for silicon surface passivation

<p>This manuscript reports an experimental and theoretical study of the transport of potassium ions in thin silicon dioxide films. While alkali contamination was largely researched in the context of MOSFET instability, recent reports indicate that potassium ions can be embedded into oxide film...

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Main Authors: Bonilla Osorio, R, Wilshaw, P
Format: Journal article
Published: IOP Science 2017
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author Bonilla Osorio, R
Wilshaw, P
author_facet Bonilla Osorio, R
Wilshaw, P
author_sort Bonilla Osorio, R
collection OXFORD
description <p>This manuscript reports an experimental and theoretical study of the transport of potassium ions in thin silicon dioxide films. While alkali contamination was largely researched in the context of MOSFET instability, recent reports indicate that potassium ions can be embedded into oxide films to produce dielectric materials with permanent electric charge, also known as electrets. These electrets are integral to a number of applications, including the passivation of silicon surfaces for optoelectronic devices. In this work, electric field assisted migration of ions is used to rapidly drive K<sup>+</sup> into SiO<sub>2</sub> and produce effective passivation of silicon surfaces. Charge concentrations of up to ~5 × 10<sup>12</sup> e cm<sup>−2</sup> have been achieved. This charge was seen to be stable for over 1500 d, with decay time constants as high as 17 000 d, producing an effectively passivated oxide–silicon interface with SRV &lt; 7 cm s<sup>−1</sup>, in 1 Ω cm n-type material. This level of charge stability and passivation effectiveness has not been previously reported. Overall, this is a new and promising methodology to enhance surface passivation for the industrial manufacture of silicon optoelectronic devices.</p>
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spelling oxford-uuid:db138f04-0164-4936-b91e-6ef693a5f56e2022-03-27T09:07:50ZPotassium ions in SiO2: electrets for silicon surface passivationJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:db138f04-0164-4936-b91e-6ef693a5f56eSymplectic Elements at OxfordIOP Science2017Bonilla Osorio, RWilshaw, P<p>This manuscript reports an experimental and theoretical study of the transport of potassium ions in thin silicon dioxide films. While alkali contamination was largely researched in the context of MOSFET instability, recent reports indicate that potassium ions can be embedded into oxide films to produce dielectric materials with permanent electric charge, also known as electrets. These electrets are integral to a number of applications, including the passivation of silicon surfaces for optoelectronic devices. In this work, electric field assisted migration of ions is used to rapidly drive K<sup>+</sup> into SiO<sub>2</sub> and produce effective passivation of silicon surfaces. Charge concentrations of up to ~5 × 10<sup>12</sup> e cm<sup>−2</sup> have been achieved. This charge was seen to be stable for over 1500 d, with decay time constants as high as 17 000 d, producing an effectively passivated oxide–silicon interface with SRV &lt; 7 cm s<sup>−1</sup>, in 1 Ω cm n-type material. This level of charge stability and passivation effectiveness has not been previously reported. Overall, this is a new and promising methodology to enhance surface passivation for the industrial manufacture of silicon optoelectronic devices.</p>
spellingShingle Bonilla Osorio, R
Wilshaw, P
Potassium ions in SiO2: electrets for silicon surface passivation
title Potassium ions in SiO2: electrets for silicon surface passivation
title_full Potassium ions in SiO2: electrets for silicon surface passivation
title_fullStr Potassium ions in SiO2: electrets for silicon surface passivation
title_full_unstemmed Potassium ions in SiO2: electrets for silicon surface passivation
title_short Potassium ions in SiO2: electrets for silicon surface passivation
title_sort potassium ions in sio2 electrets for silicon surface passivation
work_keys_str_mv AT bonillaosorior potassiumionsinsio2electretsforsiliconsurfacepassivation
AT wilshawp potassiumionsinsio2electretsforsiliconsurfacepassivation