Fabrication of gated polycrystalline silicon field emitters
Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters.
| Main Authors: | , , , , |
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| Format: | Conference item |
| Published: |
1996
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| Summary: | Polycrystalline silicon is currently being investigated as the cathode material for flat panel displays using field emission. Conventional silicon microfabrication techniques have been adapted to produce highly uniform arrays of gridded polysilicon field emitters. |
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