High-resolution scanning electron microscopy of dopants in p-i-n junctions with quantum wells
We have studied the electric field distribution in p-i-n structures with multi-quantum wells (MQW) using the method of dopant (ionization potential) contrast in high resolution (with a cold field emission electron gun) scanning electron microscopy (HRSEM). The samples are GaAs-based ternary compound...
मुख्य लेखकों: | Barkay, Z, Grunbaum, E, Shapira, Y, Wilshaw, P, Barnham, K, Bushnell, B, Ekins-Daukes, N, Mazzer, M |
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स्वरूप: | Conference item |
प्रकाशित: |
2004
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समान संसाधन
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The electric field and dopant distribution in p-i-n structures observed by ionisation potential (dopant contrast) microscopy in the HRSEM
द्वारा: Grunbaum, E, और अन्य
प्रकाशित: (2005) -
Secondary electron emission contrast of quantum wells in GaAs p-i-n junctions.
द्वारा: Grunbaum, E, और अन्य
प्रकाशित: (2009) -
Scanning tunneling microscopy of buried dopants in silicon: images and their uncertainties
द्वारा: Piotr T. Różański, और अन्य
प्रकाशित: (2022-08-01) -
Overview and loss analysis of III–V single-junction and multi-junction solar cells
द्वारा: Yamaguchi Masafumi, और अन्य
प्रकाशित: (2022-01-01) -
Mechanism for secondary electron dopant contrast in the SEM
द्वारा: Sealy, C, और अन्य
प्रकाशित: (2000)