High resolution x-ray photoemission study of plasma oxidation of indium-tin-oxide thin film surfaces
The influence of plasma oxidation and other surface pretreatments on the electronic structure of indium-tin-oxide (ITO) thin films has been studied by high resolution x-ray photoemission spectroscopy. Plasma oxidation compensates n-type doping in the near surface region and leads to a reduction in t...
| Main Authors: | , , , , , , |
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| פורמט: | Journal article |
| שפה: | English |
| יצא לאור: |
2000
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