Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C

The rates of interdiffusion of Re and Ru at 1000 and 1100 °C in binary diffusion couples with single phase face centred cubic (fcc) microstructures have been characterised and compared to their respective rates in the presence of one another in ternary Ni-Re-Ru couples. The diffusivity of Re in Ni a...

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Main Authors: Hobbs, R, Karunaratne, M, Tin, S, Reed, R, Rae, C
Format: Journal article
Language:English
Published: 2007
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author Hobbs, R
Karunaratne, M
Tin, S
Reed, R
Rae, C
author_facet Hobbs, R
Karunaratne, M
Tin, S
Reed, R
Rae, C
author_sort Hobbs, R
collection OXFORD
description The rates of interdiffusion of Re and Ru at 1000 and 1100 °C in binary diffusion couples with single phase face centred cubic (fcc) microstructures have been characterised and compared to their respective rates in the presence of one another in ternary Ni-Re-Ru couples. The diffusivity of Re in Ni at 1000 °C (6.12 × 1018 m2/s) and at 1100 °C (9.31 × 10-17 m2/s) was found to be an order of magnitude slower than that of Ru at both temperatures (5.01 × 10-17 and 4.71 × 10-16 m2/s at 1000 and 1100 °C, respectively). The interdiffusion coefficient of Re was found to be unaffected by the presence of Ru in the ternary Ni-Re-Ru alloy (6.08 × 10-18 and 9.16 × 10-17 m2/s at 1000 and 1100 °C, respectively). That of Ru was modestly reduced by the presence of Re to 3.45 × 10-17 and 2.36 × 10-16 m2/s at 1000 and 1100 °C, respectively. Uphill diffusion of Ru was evident in the diffusion zone of the Ni-Re-Ru/Ni-Ru couples under all annealing conditions despite the absence of a Ru concentration gradient. The uphill diffusion of Ru was opposite to and of the same order of magnitude of Re, the principal diffusing element. This suggests Re lowers the chemical potential of Ru thus promoting uphill Ru diffusion to equilibrate the chemical potential gradient. Lowering of the chemical potential of Ru by Re is consistent with thermodynamically stable Re-Ru bonding which may contribute to the enhanced microstructural stability and high temperature creep performance documented in Ru-bearing Ni-base single crystal superalloys. © 2007 Elsevier B.V. All rights reserved.
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spelling oxford-uuid:ebb86241-91a8-4447-b620-090c982d7fd62022-03-27T11:11:54ZUphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees CJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:ebb86241-91a8-4447-b620-090c982d7fd6EnglishSymplectic Elements at Oxford2007Hobbs, RKarunaratne, MTin, SReed, RRae, CThe rates of interdiffusion of Re and Ru at 1000 and 1100 °C in binary diffusion couples with single phase face centred cubic (fcc) microstructures have been characterised and compared to their respective rates in the presence of one another in ternary Ni-Re-Ru couples. The diffusivity of Re in Ni at 1000 °C (6.12 × 1018 m2/s) and at 1100 °C (9.31 × 10-17 m2/s) was found to be an order of magnitude slower than that of Ru at both temperatures (5.01 × 10-17 and 4.71 × 10-16 m2/s at 1000 and 1100 °C, respectively). The interdiffusion coefficient of Re was found to be unaffected by the presence of Ru in the ternary Ni-Re-Ru alloy (6.08 × 10-18 and 9.16 × 10-17 m2/s at 1000 and 1100 °C, respectively). That of Ru was modestly reduced by the presence of Re to 3.45 × 10-17 and 2.36 × 10-16 m2/s at 1000 and 1100 °C, respectively. Uphill diffusion of Ru was evident in the diffusion zone of the Ni-Re-Ru/Ni-Ru couples under all annealing conditions despite the absence of a Ru concentration gradient. The uphill diffusion of Ru was opposite to and of the same order of magnitude of Re, the principal diffusing element. This suggests Re lowers the chemical potential of Ru thus promoting uphill Ru diffusion to equilibrate the chemical potential gradient. Lowering of the chemical potential of Ru by Re is consistent with thermodynamically stable Re-Ru bonding which may contribute to the enhanced microstructural stability and high temperature creep performance documented in Ru-bearing Ni-base single crystal superalloys. © 2007 Elsevier B.V. All rights reserved.
spellingShingle Hobbs, R
Karunaratne, M
Tin, S
Reed, R
Rae, C
Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title_full Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title_fullStr Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title_full_unstemmed Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title_short Uphill diffusion in ternary Ni-Re-Ru alloys at 1000 and 1100 degrees C
title_sort uphill diffusion in ternary ni re ru alloys at 1000 and 1100 degrees c
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AT karunaratnem uphilldiffusioninternarynirerualloysat1000and1100degreesc
AT tins uphilldiffusioninternarynirerualloysat1000and1100degreesc
AT reedr uphilldiffusioninternarynirerualloysat1000and1100degreesc
AT raec uphilldiffusioninternarynirerualloysat1000and1100degreesc