Reactivity patterns of stibine and trisdimethylaminoantimony precursors for chemical beam epitaxial growth and etching

Reactivity patterns of stibine and trisdimethylaminoantimony precursors for chemical beam epitaxial growth and etching

The handling and use of stibine in a CBE environment has been investigated and found to be very straightforward, permitting its use as a CBE precursor. Growth studies of GaSb and InSb on GaAs and SiO2 substrates using this precursor are reported. The compound displays a similar surface reactivity pa...

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Sonraí bibleagrafaíochta
Príomhchruthaitheoirí:	Foord, J, Howard, F, McGrady, G, Davies, G
Formáid:	Conference item
Foilsithe / Cruthaithe:	1998

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