Reactivity patterns of stibine and trisdimethylaminoantimony precursors for chemical beam epitaxial growth and etching
The handling and use of stibine in a CBE environment has been investigated and found to be very straightforward, permitting its use as a CBE precursor. Growth studies of GaSb and InSb on GaAs and SiO2 substrates using this precursor are reported. The compound displays a similar surface reactivity pa...
| Những tác giả chính: | , , , |
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| Định dạng: | Conference item |
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1998
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