Characterization of a broadband multi-keV laser plasma x-ray source for femtosecond time-resolved EXAFS
Recent advances in femtosecond laser plasma x-rays sources have resulted in several experiments to explore the dynamics of physical and chemical processes on the femtosecond time scale. We present our most recent progresses on the development of an intense broadband x-ray source in the multi-keV ran...
| Hlavní autoři: | , , , , , , , |
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| Médium: | Conference item |
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2001
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| Shrnutí: | Recent advances in femtosecond laser plasma x-rays sources have resulted in several experiments to explore the dynamics of physical and chemical processes on the femtosecond time scale. We present our most recent progresses on the development of an intense broadband x-ray source in the multi-keV range, for application to time-resolved EXAFS experiments. Experiments have been realized with two different CPA laser systems having different pulse durations and characteristics. X-ray emissions in the 5KeV range generated from solid targets with the MRS Nd:Glass laser (400fs, high contrast) and the UCSD Ti:Sapphire laser (20fs, 20Hz) have been characterized through high resolution and time resolved x-ray spectroscopy. The application of this source to time resolved EXAFS measurements with a subpicosecond time resolution will also be discussed. |
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