Direct observation of hydrogen at defects in multicrystalline silicon

Hydrogen passivation is a key industrial technique used to reduce the recombination activity of defects in multicrystalline silicon (mc‐Si). However, not all dislocations and grain boundaries respond well to traditional hydrogen passivation techniques. In order to understand the reasons for these di...

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المؤلفون الرئيسيون: Tweddle, D, Hamer, P, Shen, Z, Markevich, VP, Moody, MP, Wilshaw, PR
التنسيق: Journal article
اللغة:English
منشور في: Wiley 2019
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author Tweddle, D
Hamer, P
Shen, Z
Markevich, VP
Moody, MP
Wilshaw, PR
author_facet Tweddle, D
Hamer, P
Shen, Z
Markevich, VP
Moody, MP
Wilshaw, PR
author_sort Tweddle, D
collection OXFORD
description Hydrogen passivation is a key industrial technique used to reduce the recombination activity of defects in multicrystalline silicon (mc‐Si). However, not all dislocations and grain boundaries respond well to traditional hydrogen passivation techniques. In order to understand the reasons for these different behaviours, and how superior passivation might be achieved, a method is required for the direct observation of hydrogen at these defects. Here, we present a novel characterisation technique based on a combination of transmission Kikuchi diffraction (TKD), atom probe tomography (APT), and isotopic substitution that enables unambiguous detection and quantification of hydrogen atoms present at crystallographic defects in mc‐Si.
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spelling oxford-uuid:f9414f29-d0f0-4c04-8380-a7e5b8878f142023-02-10T08:33:41ZDirect observation of hydrogen at defects in multicrystalline siliconJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:f9414f29-d0f0-4c04-8380-a7e5b8878f14EnglishSymplectic Elements at OxfordWiley2019Tweddle, DHamer, PShen, ZMarkevich, VPMoody, MPWilshaw, PRHydrogen passivation is a key industrial technique used to reduce the recombination activity of defects in multicrystalline silicon (mc‐Si). However, not all dislocations and grain boundaries respond well to traditional hydrogen passivation techniques. In order to understand the reasons for these different behaviours, and how superior passivation might be achieved, a method is required for the direct observation of hydrogen at these defects. Here, we present a novel characterisation technique based on a combination of transmission Kikuchi diffraction (TKD), atom probe tomography (APT), and isotopic substitution that enables unambiguous detection and quantification of hydrogen atoms present at crystallographic defects in mc‐Si.
spellingShingle Tweddle, D
Hamer, P
Shen, Z
Markevich, VP
Moody, MP
Wilshaw, PR
Direct observation of hydrogen at defects in multicrystalline silicon
title Direct observation of hydrogen at defects in multicrystalline silicon
title_full Direct observation of hydrogen at defects in multicrystalline silicon
title_fullStr Direct observation of hydrogen at defects in multicrystalline silicon
title_full_unstemmed Direct observation of hydrogen at defects in multicrystalline silicon
title_short Direct observation of hydrogen at defects in multicrystalline silicon
title_sort direct observation of hydrogen at defects in multicrystalline silicon
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AT hamerp directobservationofhydrogenatdefectsinmulticrystallinesilicon
AT shenz directobservationofhydrogenatdefectsinmulticrystallinesilicon
AT markevichvp directobservationofhydrogenatdefectsinmulticrystallinesilicon
AT moodymp directobservationofhydrogenatdefectsinmulticrystallinesilicon
AT wilshawpr directobservationofhydrogenatdefectsinmulticrystallinesilicon