Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy.
Evaluation of the intracellular distribution of radionuclides used for targeted radiotherapy (tRT) is essential for accurate dosimetry. Therefore, a direct and quantitative method for subcellular micro-autoradiography using radiation sensitive polymers (PMMA, UV1116 and AZ40XT) was developed. The el...
| Main Authors: | , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2011
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| _version_ | 1797105404282404864 |
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| author | Falzone, N Nathan, R Myhra, S Chakalova, R Altebaeumer, T Vallis, K |
| author_facet | Falzone, N Nathan, R Myhra, S Chakalova, R Altebaeumer, T Vallis, K |
| author_sort | Falzone, N |
| collection | OXFORD |
| description | Evaluation of the intracellular distribution of radionuclides used for targeted radiotherapy (tRT) is essential for accurate dosimetry. Therefore, a direct and quantitative method for subcellular micro-autoradiography using radiation sensitive polymers (PMMA, UV1116 and AZ40XT) was developed. The electron exposure dose in radio-labelled cells due to Auger and internal conversion (IC) electron emissions of indium (¹¹¹In), a radionuclide currently used for tRT, was calculated using Monte Carlo (MC) simulation. Electron beam lithography using pre-defined exposure doses was used to calibrate the resist response. The topography of the exposed and developed resists was analysed with atomic force microscopy (AFM) and the resulting pattern depth was related to a specific exposure dose. UV1116 exhibited the best contrast as compared to AZ40XT and PMMA, while AZ40XT exhibited the highest sensitivity at low doses (<10 μC/cm²). AFM analysis of the exposure pattern from radio-labelled cells and nuclei in UV1116 revealed a non-uniform distribution of ¹¹¹In-EGF in the cell and nucleus, consistent with less well-resolved data from confocal microscopy and micro-autoradiography. |
| first_indexed | 2024-03-07T06:47:03Z |
| format | Journal article |
| id | oxford-uuid:fb37f9d8-8640-47b6-a144-237846697659 |
| institution | University of Oxford |
| language | English |
| last_indexed | 2024-03-07T06:47:03Z |
| publishDate | 2011 |
| record_format | dspace |
| spelling | oxford-uuid:fb37f9d8-8640-47b6-a144-2378466976592022-03-27T13:12:06ZChemically amplified photoresist for high resolution autoradiography in targeted radiotherapy.Journal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:fb37f9d8-8640-47b6-a144-237846697659EnglishSymplectic Elements at Oxford2011Falzone, NNathan, RMyhra, SChakalova, RAltebaeumer, TVallis, KEvaluation of the intracellular distribution of radionuclides used for targeted radiotherapy (tRT) is essential for accurate dosimetry. Therefore, a direct and quantitative method for subcellular micro-autoradiography using radiation sensitive polymers (PMMA, UV1116 and AZ40XT) was developed. The electron exposure dose in radio-labelled cells due to Auger and internal conversion (IC) electron emissions of indium (¹¹¹In), a radionuclide currently used for tRT, was calculated using Monte Carlo (MC) simulation. Electron beam lithography using pre-defined exposure doses was used to calibrate the resist response. The topography of the exposed and developed resists was analysed with atomic force microscopy (AFM) and the resulting pattern depth was related to a specific exposure dose. UV1116 exhibited the best contrast as compared to AZ40XT and PMMA, while AZ40XT exhibited the highest sensitivity at low doses (<10 μC/cm²). AFM analysis of the exposure pattern from radio-labelled cells and nuclei in UV1116 revealed a non-uniform distribution of ¹¹¹In-EGF in the cell and nucleus, consistent with less well-resolved data from confocal microscopy and micro-autoradiography. |
| spellingShingle | Falzone, N Nathan, R Myhra, S Chakalova, R Altebaeumer, T Vallis, K Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title | Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title_full | Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title_fullStr | Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title_full_unstemmed | Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title_short | Chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy. |
| title_sort | chemically amplified photoresist for high resolution autoradiography in targeted radiotherapy |
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