Numerical investigation of the plasma-aided fabrication of stoichiometric InAs nanodots at early stage of the growth
Using numerical modeling of the plasma sheath and key surface processes, the plasma-aided fabrication of InAs nanodots is investigated at early stage of the growth. Roles of different plasma process parameters, such as electron temperature, electron number density, and ion-to-electron density ratio...
| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
American Institute of Physics
2013
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| Subjects: | |
| Online Access: | http://eprints.um.edu.my/10638/1/00006469_100295.pdf |