Effects of annealing treatment on optical properties of anatase TiO 2 thin films

In this investigation, anatase TiO 2 thin films were grown by radio frequency magnetron sputtering on glass substrates at a high sputtering pressure and room temperature. The anatase films were then annealed at 300-600 °C in air for a period of 1 hour. To examine the structure and morphology of the...

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Main Authors: Hasan, M.M., Haseeb, A.S. Md. Abdul, Saidur, Rahman, Masjuki, Haji Hassan
Format: Article
Published: World Academy of Science, Engineering and Technology 2009
Subjects:
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author Hasan, M.M.
Haseeb, A.S. Md. Abdul
Saidur, Rahman
Masjuki, Haji Hassan
author_facet Hasan, M.M.
Haseeb, A.S. Md. Abdul
Saidur, Rahman
Masjuki, Haji Hassan
author_sort Hasan, M.M.
collection UM
description In this investigation, anatase TiO 2 thin films were grown by radio frequency magnetron sputtering on glass substrates at a high sputtering pressure and room temperature. The anatase films were then annealed at 300-600 °C in air for a period of 1 hour. To examine the structure and morphology of the films, X-ray diffraction (XRD) and atomic force microscopy (AFM) methods were used respectively. From X-ray diffraction patterns of the TiO 2 films, it was found that the as-deposited film showed some differences compared with the annealed films and the intensities of the peaks of the crystalline phase increased with the increase of annealing temperature. From AFM images, the distinct variations in the morphology of the thin films were also observed. The optical constants were characterized using the transmission spectra of the films obtained by UV-VIS-IR spectrophotometer. Besides, optical thickness of the film deposited at room temperature was calculated and cross-checked by taking a cross-sectional image through SEM. The optical band gaps were evaluated through Tauc model. It was observed that TiO 2 films produced at room temperatures exhibited high visible transmittance and transmittance decreased slightly with the increase of annealing temperatures. The films were found to be crystalline having anatase phase. The refractive index of the films was found from 2.31-2.35 in the visible range. The extinction coefficient was nearly zero in the visible range and was found to increase with annealing temperature. The allowed indirect optical band gap of the films was estimated to be in the range from 3.39 to 3.42 eV which showed a small variation. The allowed direct band gap was found to increase from 3.67 to 3.72 eV. The porosity was also found to decrease at a higher annealing temperature making the film compact and dense.
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spelling um.eprints-67922018-10-18T03:55:47Z http://eprints.um.edu.my/6792/ Effects of annealing treatment on optical properties of anatase TiO 2 thin films Hasan, M.M. Haseeb, A.S. Md. Abdul Saidur, Rahman Masjuki, Haji Hassan TA Engineering (General). Civil engineering (General) TJ Mechanical engineering and machinery In this investigation, anatase TiO 2 thin films were grown by radio frequency magnetron sputtering on glass substrates at a high sputtering pressure and room temperature. The anatase films were then annealed at 300-600 °C in air for a period of 1 hour. To examine the structure and morphology of the films, X-ray diffraction (XRD) and atomic force microscopy (AFM) methods were used respectively. From X-ray diffraction patterns of the TiO 2 films, it was found that the as-deposited film showed some differences compared with the annealed films and the intensities of the peaks of the crystalline phase increased with the increase of annealing temperature. From AFM images, the distinct variations in the morphology of the thin films were also observed. The optical constants were characterized using the transmission spectra of the films obtained by UV-VIS-IR spectrophotometer. Besides, optical thickness of the film deposited at room temperature was calculated and cross-checked by taking a cross-sectional image through SEM. The optical band gaps were evaluated through Tauc model. It was observed that TiO 2 films produced at room temperatures exhibited high visible transmittance and transmittance decreased slightly with the increase of annealing temperatures. The films were found to be crystalline having anatase phase. The refractive index of the films was found from 2.31-2.35 in the visible range. The extinction coefficient was nearly zero in the visible range and was found to increase with annealing temperature. The allowed indirect optical band gap of the films was estimated to be in the range from 3.39 to 3.42 eV which showed a small variation. The allowed direct band gap was found to increase from 3.67 to 3.72 eV. The porosity was also found to decrease at a higher annealing temperature making the film compact and dense. World Academy of Science, Engineering and Technology 2009 Article PeerReviewed Hasan, M.M. and Haseeb, A.S. Md. Abdul and Saidur, Rahman and Masjuki, Haji Hassan (2009) Effects of annealing treatment on optical properties of anatase TiO 2 thin films. World Academy of Science, Engineering and Technology, 40. pp. 221-225. ISSN 2010-376X, http://www.scopus.com/inward/record.url?eid=2-s2.0-78651563516&partnerID=40&md5=26da9d516314cb73b1af6f39423eef6d
spellingShingle TA Engineering (General). Civil engineering (General)
TJ Mechanical engineering and machinery
Hasan, M.M.
Haseeb, A.S. Md. Abdul
Saidur, Rahman
Masjuki, Haji Hassan
Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title_full Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title_fullStr Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title_full_unstemmed Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title_short Effects of annealing treatment on optical properties of anatase TiO 2 thin films
title_sort effects of annealing treatment on optical properties of anatase tio 2 thin films
topic TA Engineering (General). Civil engineering (General)
TJ Mechanical engineering and machinery
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