Effect of energetic ion beam irradiation on structural and optical properties of a-Si:H thin films
Hydrogenated amorphous silicon (a-Si:H) thin films deposited by radio-frequency plasma enhanced chemical vapor deposition were irradiated by an energetic argon ion beam source from a 3.3 kJ Mather type dense plasma focus device. The effect of the energetic ion beam irradiation on the structural and...
| Main Authors: | , , , , |
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| Format: | Article |
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2013
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| Subjects: |